Hot Mirrors
Evaporated Metal Films (EMF)
Hot Mirror, Wide Band, 0
Hot Mirror Specifications | HMW-0-25D
Transmission Region |
450-645 nm |
Reflection Region |
750-1200 nm |
|---|---|---|---|
Reflection (min) |
90% |
Size (mm) |
25 mm Dia. |
Size Tolerance |
± 0.1 mm |
Thickness |
1.0 mm |
Thickness Tolerance |
+0.25/-0.00 mm |
Angle of Incidence |
0⁰ |
Scratch/Dig |
60-40 |
Clear Aperture |
90% |
Parallelism |
≤ 3 arc min. |
You may also like…
-
Scanning Monochromator, 500 nm – 1.2 μ
Scanning Mini-Chrom Monochromator Specifications | SMC1-04
Operating Range
500 nm – 1.2 μ
f Number
3.9
Focal Length
74 mm
Beam Path
In Line
Resolution with 50μ slits
0.53 nm
Resolution with 100μ slits
1.06 nm
Resolution with 150μ slits
1.59 nm
Resolution with 300μ slits (included)
3.19 nm
Resolution with 600μ slits
6.37 nm
Resolution with 1 mm slits
10.62 nm
Grating Density
1200 grooves/mm
Grating Blaze Wavelength
750 nm
Linear Dispersion (Center of Range)
10.66 nm/mm
Stray Light
≤ 0.02%
Wavelength Accuracy
± 0.2% of λ
Wavelength Reproducibility
± 0.15%
Drive Hystersis
3.6° typical; 14° maximum
Operating Temperature Range
-20° C to +80° C
Damage Threshold: Pulsed
350 mJ /cm², 200 nano sec. pulse
Damage Threshold: CW laser
40 Watt/cm²
